£3.7 million earmarked for ‘business-led’ partnerships.
Caltech start-up says that it is working with customers on mobile device applications.
Key lithography light source provider reports 99.7% simulated die yield at 40W EUV power and 97.5% at 55W.
UK research group will bring modeling expertise to remainder of ‘MODE-GAP’ effort.
German-Canadian research team develops clean, versatile "nano-LEDs".
'Industrially focused' effort with 31 industry partners will be co-ordinated by Duncan Hand at Heriot-Watt University.
Photonics selected as one of seven new collaborative research centers in the country.
Sapphire supplier GT will commercialize new system designed to speed deposition of light-emitting semiconductor layers.
Japanese firm is competing with US-based Cymer and others to advance EUV lithography into production.
German company details high-power diode bars with up to 67% wallplug efficiency at 976 nm.
Center of excellence in Neuchâtel to receive CHF19 million in funding from Swiss government over coming years.
The New Mexico company lands a five-year award from the US Air Force to advance multi-junction devices.