26 Feb 2007
Powerlase is working with University College Dublin to develop a light source for "next-generation" extreme-ultraviolet lithography technology.
Powerlase, which claims to manufacture the world's most powerful nanosecond Q-switched, diode-pumped solid state lasers, is collaborating with University College Dublin to further the development of laser-produced plasma (LPP) as a light source for extreme ultraviolet lithography (EUV).
The aim of the research is to develop a robust and cost-effective laser capable of providing a suitable light source for use in EUV lithography. Researchers from UCD will use vacuum equipment, provided by Powerlase, to conduct a study of ion-emissions of the LPP EUV source. The LPP EUV approach is a promising technology for the high-volume manufacture of semiconductors at 32 nm and below.
This cooperation follows Powerlase's previously reported research collaborations in EUV lithography with the Extreme Ultraviolet Lithography Association (EUVA) in Japan and leading US academics at the University of Central Florida (UCF). The company, which is based in Crawley, UK, supplied both organizations with Starlase lasers to advance the EUV source development required for EUVL.
"We believe the LPP source approach, which is driven by a diode pumped solid state laser, is the way forward in achieving the requirements for the EUV source," said Samir Ellwi, VP Strategic Innovations at Powerlase. "The technique also drives down cost of ownership compared with other laser technologies."
Professor Gerry O'Sullivan, Head of School of Physics at University College Dublin, added, "Our work will be extremely valuable in progressing the EUV research and development program and strengthening our links with the major industrial players in this important field. We are dedicated to advancing next-generation lithography techniques and believe our work will lead to significant breakthroughs in EUVL."
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