Research tackles optical protection

17 Jun 2002

US-based Extraction Systems promises to cut industry costs by reducing optics contamination problems.

The manufacturer of monitors for ultraclean environments has launched a new research and development group to combat airborne contaminants that can wreak havoc in advanced UV lithography systems.

By investigating ways to protect optical elements in 193 nm lithography tools, the company hopes to prolong the lifetimes of optical systems.

"The cost of optics assembly used in 193 nm tools is the highest the industry has ever seen so protection is a prime concern," said president and chief executive of Extraction Systems, Devon Kinhead. "The industry's understanding of optical contamination risks is still in its infancy, but our R&D group will provide the best monitoring and filtration technology."