 |
17 Jun 2002
Infineon Technologies of Munich, Germany, has extended its research collaboration with the IMEC research centre in Leuven, Belgium. Infineon has joined several IMEC programs including advanced CMOS process steps and modules, which will focus on providing basic technologies for manufacture at dimensions of 70 nm and less, and advanced optical lithography.
In particular, the company will collaborate with IMEC in a joint lithography program that aims to extend the limit of optical lithography into the sub-100 nm region. The program will focus on research of deep-ultraviolet lithography processes with 157 nm optical wavelength.
"The joint development agreement is another example of Infineon's strategy to secure highly advanced technologies and methodologies," said Franz Neppi, senior vice-president of corporate development at Infineon.
 |  |  |  |  |  |  |
| © 2025 SPIE Europe |
|
