17 Jun 2002
The Defense Advanced Research Projects Agency and the Naval Air Systems Command have awarded a four-year, $4 million contract to Etec Systems to develop advanced multiple electron beam microcolumns for nanolithography. The work will support DARPA's nanolithography project initiatives which have the goal of building core technologies to meet future microelectronics needs. Microcolums, or miniaturized electron beam columns, are configured in close arrays and belived to provide high patterning throughput and high performance.
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