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13 Jul 2006
Claiming its new ArF laser to be the world's first laser for 45nm immersion lithography, Cymer is hoping to corner this semiconductor development technology market.
Cymer, Inc., San Diego CA, US, a developer of deep ultraviolet (DUV) lasers, often deployed in semiconductor manufacturing, has launched what it describes as the world's first argon fluoride source intended for 45nm production immersion photolithography.
The XLR 500i-is based on Cymer's established "Ring Technology" and it enables a 150% improvement in energy stability performance and a more than 20% reduction in cost of ownership compared to previous generation ArF devices.
As immersion lithography is deployed into 45nm production, it is important for chipmakers to employ laser light sources that improve critical dimension control, says Cymer.
"The XLR 500i architecture, which is an improvement on our dual-chamber platform, replaces the conventional power amplifier stage with an innovative Recirculating Ring," the company states.
The Ring delivers a step-function improvement in pulse energy stability, which enables both yield and productivity enhancements. Further, the improved dose performance can also reduce the number of laser pulses consumed during the wafer exposure process, thereby cutting operational costs per wafer.
The Ring Technology in the XLR 500i has the effect of doubling the lifetime of two key modules within these MOPA-based ArF laser light sources. This results in significantly improved productivity compared to earlier generation ArF devices.
Together, the reduced requirement for pulses per wafer due to advances in dose control and improved module lifetimes, result in the reduction in operating costs, Cymer says.
The XLR system is an optical development based upon the XL platform, a platform promoted by the company as an industry standard for next-generation ArF lithography. Cymer has already shipped more than 300 XL systems to date.
"The XLR represents the latest innovation in laser light source architectures for photolithography," says Ed Brown, Cymer's President and COO. "With this tool we are leveraging our previous R&D efforts to take ArF capabilities to the next level of performance and cost efficiency, advancing the production of chips that power everyday electronic devices."
Klaus Rinnen, managing vice president at Gartner, adds, "Lithographers have been continually challenged to reduce the total operating costs of ArF tools. Next generation lithography tools that combine improved CD control and longer life modules to enable improved cost of ownership will help make sub-45nm semiconductor manufacturing a reality."
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