25 Jun 2004
Including news from Universal Display Corporation, IPG Photonics, Nichia and more.
General company news:
• Universal Display Corporation (UDC) and Palo Alto Research Center, a subsidiary of Xerox, have teamed up to develop polysilicon thin-film transistor (TFT) backplane technology on metal foil. The collaboration believes that the use of metallic substrates will accelerate the development of flexible TFT backplanes, which is currently limiting the commercialization of flexible active-matrix displays.
• IPG Photonics, the US fiber laser specialist, has opened an office in Tokyo. "IPG sales in Japan reached a critical size last year and the introduction of IPG's kilowatt-class laser opened many opportunities," said Valentin Gapontsev, IPG's CEO. "The business required stronger technical support for the large and fast-growing customer base."
• Nichia has filed a request for a preliminary injunction order against E&E Japan - the Japanese affiliate of Taiwan-based Everlight and Epistar. Nichia claims that E&E Japan is infringing Japanese patent number JP 2927279. The patent refers to a semiconductor device and phosphor combination that produces a white light from an LED.
• Bookham Technology, the UK maker of optical components and subsystems, plans to change the corporate domicile of the company to the US. The move will see every ten existing Bookham ordinary shares exchanged for one share of common stock in a newly incorporated Delaware company "Bookham Inc". The Bookham Inc common stock is expected to be listed on the NASDAQ. Bookham expects to complete the change of domicile by 30 September 2004.
• Berliner Glas has agreed to produce Mitsui Chemical Europe's optical plasma display panel filters its Schwäbisch Hall facility in Germany. To accommodate this, Berliner Glas has added approximately 1500 m2 of production space and upped its cleanroom capacity by 400 m2. The expanded factory will initially produce 250 000 optical filters for various plasma displays.
• Asahi Glass of Japan says it has developed the world?s first substrate for argon fluoride immersion photolithography that can be mass-produced. The "QC-i" is a synthetic quartz photomask substrate. "This development is expected to dramatically advance the ultra-fine processing technology that is indispensable for semiconductor fabrication," said the company in a statement detailing its breakthrough.