Phantom III Reactive Ion Etch (RIE)

21 Oct 2010

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform. For more information: http://www.triontech.com/phantom.htm