19 Dec 2006 NanoCalc Reflectometry System Analyzes Wide Range of Optical Layer Thicknesses. Dunedin, Fla., November 2006 - The NanoCalc Thin Film Reflectometry System from Ocean Optics measures the thickness of up to three optical layers from 10 nm to 250 um in less than one second. Users can analyze the thickness and removal rates of both single-layer or multilayer semiconductor process films and anti-scratch, anti-reflection and hard coatings. Several options are available for measuring thin films with spectral response in UV-VIS, VIS-NIR and NIR wavelength ranges.
The NanoCalc System is especially useful for in situ, on-line thickness measurements of oxides, silicon nitride and photoresist films, as well as the thickness of rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics. Coating-measurement applications in the semiconductor, automotive, packaging and biotechnology industries are also typical.
NanoCalc’s operating software allows for simple curve fitting and accuracy measurements, and includes a large library of refractive index (n) and extinction coefficient (k) values for the most common metallic, dielectric, amorphous and crystalline substrate materials. Material types can also be defined in software by equation or dispersion formulas.
NanoCalc accessory options include motorized 150-mm and 300-mm X-Y mapping stages, 3-D thickness profiling and remote control operation via ActiveX. Also available is a 5-step silicon-silicon dioxide reference wafer with a calibrated thickness range of 0-500 nm.
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