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EUV laser amplifier system
Trumpf and Access Laser have already collaborated in the application area of extreme ultraviolet (EUV) lithography for state-of-the-art semiconductor manufacturing. Access provides high-precision laser sources whose power is then scaled to as much as 40 kilowatts by Trumpf amplifiers inside the giant patterning tools. Key customer ASML is looking to scale production of the EUV equipment as chip makers adopt the technology, which costs in excess of €100 million per tool. Photo: TRUMPF Group.
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