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Zeiss EUV optics
One of the priority areas in Zeiss' €500 million, five-year investment plan will be extreme ultraviolet (EUV) optics for next-generation lithography systems that ASML says are set to ship from 2012 onwards. This image shows a Zeiss employee working on cleaning a system used for the illumination of EUV optics. Credit: Carl Zeiss.
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