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EUV light path
The huge complexity of the EUV lithography systems integrated by ASML - reliant on knowledge and expertise in optics, lasers, and other technologies across a broad ecosystems of suppliers - makes the technology extremely difficult to replicate. The Dutch firm is now starting to build its first high-NA EUV systems, with volume production expected to begin around 2025. Intel has recently become the first customer to order a production high-NA EUV system. Image: ASML.
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