 |
 |
| ASML's EUV lithography tools are hugely complex systems that proved an enormous challenge to bring to volume production. However, the company says that the forthcoming generation of EUV systems with high-NA optics will prove much easier to bring to market, because much of the technology required is common to existing EUV tools. Photo: ASML. |
| © 2024 SPIE Europe |
|
