SPIE Photomask Technology + Extreme Ultraviolet Lithography 2022

Come to Monterey, California for the technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology

• Design automation and data prep (DFM, OPC, SMO)
• Mask write, corrections, process compensation (MPC)
• Mask blanks, defects, and metrology (materials, process, control)
• Mask process (resist, develop, etch, cleans)
• Metrology (CD, placement, AFM, AIMS)
• Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
• Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
• Nanoimprint lithography tools, mask, transfer, and resists
• Deep learning mask technology applications

Extreme Ultraviolet Lithography

• EUV readiness and insertion in manufacturing
• EUV tools, including sources and optics
• EUV mask metrology, inspection, and lifetime
• EUV mask and imaging
• EUV mask pellicles
• EUV resist materials/process and contamination
• EUV process control and stochastics
• EUV patterning and process enhancement
• EUV lithography extendibility