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SPIE Photomask Technology + Extreme Ultraviolet Lithography 2022

SPIE - The International Society for Optics and Photonics.
25-29 September 2022
Monterey, CA, United States

Come to Monterey, California for the technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.


Photomask Technology

  • Design automation and data prep (DFM, OPC, SMO)
  • Mask write, corrections, process compensation (MPC)
  • Mask blanks, defects, and metrology (materials, process, control)
  • Mask process (resist, develop, etch, cleans)
  • Metrology (CD, placement, AFM, AIMS)
  • Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
  • Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
  • Nanoimprint lithography tools, mask, transfer, and resists
  • Deep learning mask technology applications

Extreme Ultraviolet Lithography

  • EUV readiness and insertion in manufacturing
  • EUV tools, including sources and optics
  • EUV mask metrology, inspection, and lifetime
  • EUV mask and imaging
  • EUV mask pellicles
  • EUV resist materials/process and contamination
  • EUV process control and stochastics
  • EUV patterning and process enhancement
  • EUV lithography extendibility
More information is available from the Event Web Site
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DateNameLocation
Sep 05-08SPIE Sensors + Imaging 2022Germany
Sep 12-17METAMATERIALS 2022 - The 16th International Congress on Artificial Materials for Novel Wave PhenomenaItaly
Sep 25-29SPIE Photomask Technology + Extreme Ultraviolet Lithography 2022United States
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