SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Hear the latest advancements where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.
SPIE Advanced Lithography + Patterning draws more than 2,000 attendees, 50 exhibitors, and 500 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.
Featuring presentations on:
+ Optical and Extreme Ultraviolet (EUV) Nanolithography
+ DTCO and Computational Patterning
+ Metrology, Inspection, and Process Control
+ Novel Patterning Technologies
+ Advances in Patterning Materials and Processes
+ Advanced Etch Technology and Process Integration for Nanopatterning
Registration: Open –November 2021 / Close – February 2022
Submission Dates: Abstract – 1 September 2021. MSS - 21 January 2022
Exhibition: Advanced Lithography + Patterning Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.
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