Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.
Abstract due date
2 September 2020
Author notification date
19 October 2020
Manuscripts due
27 January 2021
Nick Cobb Scholarship
9 October 2020
SPIE remains committed to advancing light-based research and meeting the needs of our constituents by providing you with an opportunity for sharing your work and connecting you with the global scientific community. Currently, SPIE Advanced Lithography is scheduled to take place as planned, and we look forward to your participation.
