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SPIE Advanced Lithography 2021

SPIE - The International Society for Optics and Photonics
21-25 February 2021
Digital Forum

Participate in the leading global lithography event. Present your work in optical lithography, metrology, or EUV. Share the latest advancements at the meeting where leaders come to solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

Abstract due date
2 September 2020

Author notification date
19 October 2020

Manuscripts due
27 January 2021

Nick Cobb Scholarship
9 October 2020

SPIE remains committed to advancing light-based research and meeting the needs of our constituents by providing you with an opportunity for sharing your work and connecting you with the global scientific community. Currently, SPIE Advanced Lithography is scheduled to take place as planned, and we look forward to your participation.

More information is available from the Event Web Site
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