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SPIE Photomask Technology and the Extreme Ultraviolet Lithography 2021

SPIE - The international society for optics and photonics.
20-24 September 2020
Monterey Conference Center and Monterey Marriott/Monterey, CA, United States

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications  
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement

EUV lithography extendibility


Important Dates

Abstracts due
6 May 2020

Author notification
22 June 2020

Online Call for Papers
View 2020 details

Author information and
Student travel grant details


SPIE remains committed to providing you an opportunity for sharing your work and connecting with the global scientific community.

We are aware that many in the community are concerned about the status of SPIE Photomask Technology + EUV Lithography. Your safety and well-being are our top priority and will drive decisions we make with conference leadership. Currently, the meeting is scheduled to take place as planned, and we look forward to your participation

More information is available from the Event Web Site
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