SPIE Advanced Lithography 2016

SPIE Advanced Lithography is the premier conference for the lithography community. For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SPIE Advanced Lithography draws more than 2,300 attendees, 50 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

 + Extreme Ultraviolet (EUV) Lithography

 + Alternative Lithographic Technologies

 + Metrology, Inspection, and Process Control for Microlithography

 + Advances in Patterning Materials and Processes

 + Optical Microlithography

 + Design-Process-Technology Co-optimization for Manufacturability

 + Advanced Etch Technology for Nanopatterning

Exhibition Overview: The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 40 years.

 See the latest technology in advanced lithography:

+ Etch for nanopatterning

 + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET

 + Metrology, inspection, OPC, and process control

 + Design and manufacturing software

 + Materials and chemicals

 + Imaging equipment

 + Lasers

 + Resist materials and processing

 + Nano-imprint

 + IC and chip fabrication

+ Nanoscale imaging

 Exhibition Dates and Hours:

Tuesday 23 February 2016 | 10:00 am to 5:00 pm and 6 to 8 pm (poster reception)

Wednesday 24 February 2016 | 10:00 am to 4:00 pm