Microlithography attendance tops 2700

17 Jun 2002

More than 2700 developers and users of advanced lithography techniques for the semiconductor industry gathered in Santa Clara, California, this week at SPIE'sMicrolithography symposium. The industry's premier meeting featured a special plenary survey of past triumphs and failures and then quickly moved on to presentmore than 600 papers on the field's still-bright future. More than 115 companies exhibited their latest equipment and supplies during the two-day technical exhibition.

Microlithography '97 detailed emergent research in lithographic technologies such as electron-beam writing and x-ray lithography. Other conferences surveyedadditional optical lithography techniques; advanced resist technology and processing; and metrology, inspection and process control issues for the microlithographyindustry. Timothy A. Brunner, IBM Semiconductor R&D Center, introduces the plenary. Brunner chaired the 1997 symposium; Victor Pol, Motorola AdvancedProducts R&D Lab, was vice-chair.