Optical Filters for Photolithography

07 Nov 2017

LASER COMPONENTS now offers the i-line interference filter designed for

photolithography. This high performance and environmentally stable bandpass

filter resolves monochromatic wavelengths reaching the photomask substrate

so that optimum resolution is achievable. Designed and produced by LASER

COMPONENTS‘partners Omega Optical, the filter efficiently transmits the fine

structure of the Mercury i-line, while maximising throughput and filter life. Compared

with standard OEM filters, the new generation i-line filters deliver greatly improved

i-line intensity to the resist.

Omega i-line filters are thoroughly characterised photometrically using a researchgrade

spectrophotometer. A filter with uniform bandpass characteristics across the

entire surface yields the greatest intensity delivered to the resist. Our filters typically

exceed intensity levels offered by OEM replacement filters by 10-20%.

To complement the i-line interference filter we offer mask aligner optical filters

which provide improved exposures and sharper, straighter feature walls of the SU-8

photoresist. It is 90% transparent to visible light, allowing for proper visualisation of

mask alignment through the filter glass.

More Information https://www.lasercomponents.com/uk/optics/optical-filters/