GAIA-I - Thales Laser

09 Mar 2016

The GAIA-I pushes forward the limits of output energy reachable at high repetition rates with high reliability, and unprecedented pulse stability.

This compact and ruggedized Nd:YAG laser delivers up to 8 J at 532 nm at 5 Hz with a top hat beam profile for the most demanding industries. Now available as well in high M² version, GAIA-I is perfectly adapted to beam shaping optics - refractive or diffractive and is especially designed for high-uptime needs.

GAIA-I combines the best characteristics for many industrial applications: pulse duration and high energy to offer high intensity pulses, very low spatial modulations, high repetition rate, unprecedented energy and beam pointing stability for a faster process.

Industrial Applications

• Laser Shock Processing
• Si Annealing
• Large Area Ablation

Features

• 12 J at 1064 nm
• 8 J at 532 nm
• 6 J at 355 nm
• Up to 5 Hz repetition rate
• Very high beam quality
• Compact and rugged industrial design
• Easy maintenance
• Computer control
• Single box compact design

For more information click here! or email us at: thales-laser@fr.thalesgroup.com