24 Jan 2014 Jenoptik presents its newly developed thermally compensated lens mount design.
This patent pending technology is adhesive-free and especially designed for High-Numerical-Aperture (HNA)-DUV-optics. It reduces stress induced birefringence and improves the stability of optical components even under challenging environmental conditions.
In addition Jenoptik uses an innovative compensator concept to further exploit the outstanding opportunities of the new lens mount technology. It allows active manipulation with an accuracy of 10 Nanometers in a range of 300 Micrometers in x- and y-axis, even less if driven with state of the art actuators. The compensator ensures high-precision adjustment and position control for optical components in DUV Systems with high numerical aperture. Typical applications are optical beam delivery and illumination systems designed for micro-processing applications in the Semiconductor Equipment and Flat Panel Display industry.
The lens mount design is adaptable to optical materials like Calcium Fluoride or Fused Silica and can be made of stainless steel, aluminum and bronze. With many years of experience working with leading companies in the semiconductor industry, Jenoptik is a recognized partner from development through to series production of customized optical systems and high precision components.
Visit us at Photonics West in San Francisco, February 4th to 6th, 2014, Moscone Center, South Hall, Booth #1215 or at: www.jenoptik.com/photonics-west
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