02 Nov 2009 Laser Etching System for Thin Film Solar Cell manufacturing is equipped with a 532nm/1064nm high power laser. The system can efficiently and accurately etch different thin films on glass substrates. The systems is highly reliable with low operating cost. Customized functionalities and features can be made available on requests.
Features:
1. X-Y-Z three-dimensional adjustment
2. CCD assisted automatic positioning
3. Dust collecting system
4. Laser protecting system
5. Laser beam stabilization system
6. Friendly operating interface, real-time display of etching paths
Advantages:
1. Simple operation, few processing steps
2. Reliable and high production capability
3. A lager etching rang width
4. High processing speed
Applicable Films:
-- A-Si
-- CIS/CIGS
-- CdTe | 
