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Product Announcement

Photo Mask

09 Mar 2009

Masks are integral components in the lithographic process of semiconductor manufacturing. They contain transparent substrate which covered patterned opaque layer on it.

Key Features: High Quality , with Minimum Feature Size of 0.1 m Zero Defect Economical Price, Due to Low Fabrication Cost & High Production Capacity All Design Formats Acceptable Quick Response, within 12 Hours Material:Soda-lime glass (SL), Synthetic quartz (QZ) Minimum Feature Size: 1um (1), or per your request Plate Size: 50mm x 50mm (050-050), 75mm x 75mm (075-075), 100mm x 100mm (100-100), 125mm x 125mm (125-125), 150mm x 150mm (150-150),175mm x 175mm (175-175), 200mm x 200mm (200-200), or per your request Plate Thickness:1.5mm, 2.3mm

CONTACT DETAILS
Photonik (Singapore) Pte Ltd
German Center #04-102
25 International Business Park
Singapore
609916
Singapore
Tel: +65-6562-7976
Fax: +65-6562-7839
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