16 Aug 2007 The new Patterned Dichroic Filters are created in-house using the latest photolithography equipment and DSI’s advanced coating techniques. This precision deposition technology permits DSI to apply multiple coatings on a single substrate with dimensions as small as 100 microns, with accuracy of plus or minus one micron (+ /-1 µm) with feature placement accuracy of + /- 5 microns.
DSI’s Patterned Filters can be designed to operate over a wide range of wavelengths and offer superior performance from the near ultraviolet to the infrared. They can be applied to a variety of substrates in many shapes and sizes, as well as wafer substrates up to 100 mm diameter in materials such as silicon, glass, sapphire and fused silica. The new Patterned Dichroic Filters from DSI will meet or surpass strict adhesion and durability standards maintaining stability even in extreme temperatures and adverse conditions.
Patterned Filter coatings are ideal for use in CCD imaging applications where a single optic is required to perform multiple functions. | 
