Dresden,  Germany -- The Fraunhofer Institute for Photonic Microsystems IPMS will upgrade its microsystem cleanroom for research, development and pilot fabrication of microelectromechanical systems (MEMS) from the current 150 mm wafer base to a 200 mm process line. A total of 30 million Euro coming from state and federal sources as well as from the "European Regional Development Fund" (EFRE) have been made available to the Dresden research institute. The September 30, 2015 project start has been approved by SAB, the Development Bank of Saxony.

Both Prof. Hubert Lakner and Prof. Harald Schenk, Directors of the Fraunhofer IPMS, are delighted with the investment measure: "With the help of the state, the federal government and the EU, it is now possible for us to continue providing modern and innovative research and development ensuring efficient cooperation at the highest level with business and industry partners. Our Institute is one of the pioneers and the innovation leader in the ´More than Moore´ field. With the approval of the expeditious start of investment for the 200 mm expansion, we can now take specific action to expand our leading position among global competitors and to address emerging fields."

The most important R&D partners of Fraunhofer IPMS have already transitioned to 200 mm technology. Uniform wafer size makes it possible to attain the work distribution necessary for processing, allowing for further miniaturization and functional integration. With this commitment, Fraunhofer IPMS will establish a modern technology basis by 2017 in order to continue to provide innovative research and development to national and international partners.