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Date Announced: 09 Jul 2012
Chipmakers Realize an Increase in Depth of Focus for Contact and Via Applications.
SAN DIEGO, July 9, 2012 /PRNewswire/ -- Cymer, Inc. (CYMI), the world's leading supplier of light sources used by chipmakers to pattern advanced semiconductor chips, today announced its focus drilling technology for ArF immersion light sources has been adopted by leading chipmakers since its introduction in March 2011. Designed to support the extension of 193nm immersion lithography, focus drilling customers are currently using the technology to improve depth of focus without compromising critical dimension (CD) uniformity, performance or productivity.
Focus drilling is a process of broadening the light source bandwidth that leads to a higher depth of focus needed for contacts and vias. The technology leverages unique advancements in the light source line narrowing module (LNM) and bandwidth analysis module (BAM).
"We are pleased that our extensive customer collaboration has led to successful on-wafer results at multiple chipmakers," said Ed Brown, president and chief operating officer of Cymer. "As a result, we have now shipped this technology for new tools and upgrades to the installed base."
Available for the XLR 600ix, XLR 500i, XLA 400 and XLA 300 light sources, Cymer's focus drilling technology is part of Cymer's OnPulse™ family of support products currently installed around the world.
Source: Cymer
E-mail: via web site
Web Site: www.cymer.com
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