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Date Announced: 05 Apr 2012
Deal surrounds development of EUV lithography.
MIDDLEFIELD, Conn., April 5, 2012 (GLOBE NEWSWIRE) -- Zygo Corporation, a worldwide supplier of optical metrology instruments and high precision optical systems, today announced that its Optical Systems Division was awarded an order of over $2 million in March by a major semiconductor manufacturer to produce Extreme UltraViolet (EUV) optics used in the development of advanced lithography processes.
This order is associated with the CSNE/SEMATECH consortium Micro Exposure Tool (MET-5) program that will help researchers achieve line widths of less than 16 nanometers in support of semiconductor roadmaps projected out to the year 2025.
Zygo is one of only a few companies in the world capable of producing sub-nanometer surface quality optics and is pleased to have been selected to continue fabrication activities on this highly sophisticated ground-breaking initiative developed under the auspices of the SEMATECH program. Development and production is expected to take place over a 22-month period and will be carried out by Zygo's Extreme Precision Optics (EPO) operation in Richmond, California.
"To be entrusted with this follow-on order for some of the finest EUV optics ever made is testimony to 20 years of accomplishment in this field," said Marc Tricard, Executive Director of Business Development at Zygo.
Source: Zygo Corporation
E-mail: inquire@zygo.com
Web Site: www.zygo.com
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