Date Announced: 24 Oct 2011
Project will develop optics for EUV lithography optics.
MIDDLEFIELD, Conn. and ALBANY, N.Y., Oct 24, 2011 (GlobeNewswire via COMTEX) -- Zygo Corporation (Nasdaq:ZIGO), a worldwide supplier of optical metrology instruments and high precision optical systems, today announced that its Optical Systems Division has been awarded a contract valued in excess of $9 million with the College of Nanoscale Science and Engineering (CNSE) of the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics to be incorporated into the next, fifth generation Micro-Exposure Tool (MET-5) at CNSE's Albany NanoTech Complex. The MET-5 program is being managed by the SEMATECH consortium whose members and partners include leading semiconductor manufacturing companies worldwide.
With core strengths in nanometer precision manufacturing, system performance analysis and the extreme precision metrology required for measurement of aspheric mirrors, Zygo is proud to be one of only a few companies in the world capable of producing sub-nanometer surface quality optics and is looking forward to participating in this highly prestigious and ground-breaking program.
The MET-5 program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nanometers. This is in support of EUV resist and EUV mask developments intended to meet the international technology roadmap for semiconductors and associated decreasing linewidths. Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo's Extreme Precision Optics operation in Richmond, California.
Dr. Chris Koliopoulos, Zygo Corporation President and CEO, commenting on the contract, stated, "Development of the next generation Micro-Exposure Tool represents an important milestone for Zygo and further solidifies Zygo's position as a key supplier of EUV components. We are also very pleased to be working closely with CNSE, SEMATECH and its members to push the boundaries of photolithography technology to new, extreme levels."
Marc Tricard, Executive Director of Business Development at Zygo, added, "Zygo feels privileged to be partnering with organizations like CNSE and SEMATECH, continuing Zygo's 20 years experience in manufacturing EUV optics. This is an exciting and challenging opportunity to leverage our leading edge optics manufacturing and metrology capabilities to extend semiconductor lithography nodes well into the next decade."
Source: Zygo Corp.
Web Site: www.zygo.com