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Power play: Trumpf's EUV-generating laser
Generating EUV light with enough power to produce reliable patterning on silicon chips is tough. ASML's EUV scanners will rely on four high-power Trumpf lasers, connected in series and aimed at a stream of tin droplets. The resulting plasma emits a broadband spectrum including the key 13.5 nm EUV wavelength. Image: TRUMPF Group.
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