daily coverage of the optics & photonics industry and the markets that it serves
EUV illumination system
The wafer illumination system for the company's NXE series of EUV tools meets requirements for imaging and overlay, but the power of the EUV source (a carbon dioxide laser fired at droplets of tin) remains the bottleneck that is holding up full EUV commercialization and production deployment in semiconductor fabs. Credit: ASML.
Copyright © 2021 SPIE EuropeDesigned by Kestrel Web Services