Optics.org
daily coverage of the optics & photonics industry and the markets that it serves
Featured Showcases
Photonics West Showcase
Laser World of Photonics Showcase
News
Menu
High-NA EUV nears volume production
ASML's giant high-NA EUV lithography tools are getting closer to high-volume production use, with Intel announcing that it had accepted its first "EXE:5200B" system. Photo: ASML.
© 2026 SPIE Europe
Top of Page