14 Dec 2023
Albany Nanotech Complex will be first US publicly-owned high NA EUV lithography center.
NY CREATES’ Albany NanoTech Complex.
The partnership will fund the construction of a High NA Extreme Ultraviolet Lithography Center – described as “the first and only publicly owned High NA EUV Center in North America” – that will support the research and development of complex and powerful semiconductors.
“This $10 billion partnership to bring innovative chips research to the Capital Region should send a message to the entire industry: New York is open for business,” Governor Hochul said, Monday. “From our Green CHIPS legislation to Micron’s historic investment and the creation of GO-SEMI, we’re building the future of semiconductor research right here in New York.”
Under the initiative, NY CREATES will acquire and install a High NA EUV lithography tool, designed and manufactured by ASML, at its Albany NanoTech Complex. Industry partners including Micron, IBM, Applied Materials, Tokyo Electron, and others will use what is described as “the most advanced semiconductor equipment ever made”.
‘Pipeline for semiconductor innovation’
Once built, New York’s High NA EUV Center will position the state as a destination for research and development of innovative chip technology. The Center is also intended to foster international partnerships by encouraging research organizations worldwide to expand their presence in New York State.
The state’s announcement added, “This will significantly enhance our position as a leading candidate to secure anchor hub status under the federal National Semiconductor Technology Center, a designation with the potential to unlock more than $11 billion in federal CHIPS and Science Act funding.
It continued, “This project will create at least 700 new direct jobs and retain thousands of jobs, leverage at least $9 billion in private spending and investment, and establish significant commitments to support and build talent development pipelines, including through partnerships with the State University of New York.”
To support this project, New York State is investing $1 billion to expand the Albany NanoTech Complex with the establishment of the High NA EUV Center through the purchase of ASML’s EXE:5200 High NA EUV scanner, as well as the construction of NanoFab Reflection, a building with more than 50,000 sq. ft. of cleanroom space.