Using its dual-laser technique and magnetic ion guiding to keep the source optics clean, EUV source developer Gigaphoton is aiming to ramp output power both with additional LPP firepower, and better conversion efficiency into EUV light. The company is on track to deliver a 100W source to ASML in October 2011, with a 250W source to follow in 2012, with the initial 500W source delivery slated for mid-2013. Source: Gigaphoton. |
© 2024 SPIE Europe |
|