In a process that is similar to that used in Bragg grating manufacture, the molecular tritium (T2) permeates the silica lattice with the high pressure tritium gas exposure. The laser irradiation then locks the tritium into the silica with Si-OT bonds, which are thermally stable up to 400degC. Unreacted tritium could be effused out by a thermal annealing at 300degC. The next step is to control this process using lithography masks to target the tritium infusion at micron-level resolution.(picture credit: K Chen) |
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