12 Jan 2009 UV, VIS & NIR Reflectometers & Spectroscopic Ellipsometers for semi-transparent thin film charcterisation; Optical Emission Spectroscopy (OES) systems; Plasma Monitoring & Process Control Systems The NanoCalc range of reflectometry systems can measure the thickness of single or multiple optical layers from 10nm to 250 µm in <1s. Available for analysis of samples in the UV, Visible, NIR or combination.
The affordable, compact, easy-to-use, bench-top SpecEl spectroscopic ellipsometer is ideal for single or multi-layer, semi-transparent samples such as wafers or glass plates. Thickness measurements as well as refractive index n and absorbance k data for the wavelength range 450-900nm are delivered fast.
The PlasCalc Plasma Monitoring & Process Control System is based on optical emissions-spectroscopy. Acquiring plasma spectra from 200 to 1100nm in just 3ms, the process engineer can easily & rapidly build efficient, robust recipes for the most difficult plasma processes & diagnosis. |
