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Date Announced: 14 Sep 2018
OpticStudio provides a flexible, intuitive, and powerful modeling environment to quickly develop and capture optical design ideas. The latest release, OpticStudio 18.7, continues to improve the overall usability of OpticStudio, with new features and enhancements including:
Improved graphic export – Vector graphic and high-resolution export enable you to quickly get presentation-ready images of your analyses and layout plots without time-consuming workarounds.
New Express View for editors – Navigate files with large numbers of surfaces, objects, or operands with greatly improved responsiveness and reduced lag time from buffering data.
New Zemax File Collector tool – Easily gather data and diagnostic information necessary to troubleshoot any potential issues with your designs to send to Zemax Support.
Other improvements that help ensure the manufacturability of your design include:
New optimization operands – Three new optimization operands help you control problematic rays at the edges of the pupil without the use of macros or compound operands, as well as reduce the impact of ghost reflections in your optical system.
Improved Design Lockdown tool – Prepare a sequential optical system with multiple configurations for optomechanical analysis and production.
For a complete list of features and enhancements in the latest release, check out the OpticStudio 18.7 Release Notes.
E-mail: kerry.herbert@zemax.com
Web Site: www.zemax.com
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