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17 Jun 2002
Nine more semiconductor manufacturers, including Advanced Micro Devices, Infineon and Motorola, are joining a 157 nm lithography technology program for advanced integrated circuit (IC) manufacture.
Dutch microlithography specialist ASML launched the initiative in mid-1999, in a bid to develop a 157 nm scanning system that exceeds the requirements of the international technology roadmap for semiconductors with 70 nm circuit linewidths.
Lithography at 157 nm, which uses a fluorine excimer laser source, is seen as a key issue to be resolved if Moore's Law is to hold up over the coming decade.
The program consists of two parts. The first involves developing a 157 nm exposure system, which will allow IC makers to receive early 157 nm imaging tools. The resulting equipment is scheduled to begin shipping to program members by the end of 2003.
Stage two of the programme focuses on developing the infrastructure for 157 nm lithography, including photoresists, reticles and processes. This work will use a prototype "mini-stepper" installed at IMEC in Leuven, Belgium - a leading independent research center for state-of-the-art microelectronic technologies. Participants in this part of the program will gain first access to integrated-process knowledge for pilot production, and acquire experience with 157 nm infrastructure elements.
ASML is already involved in a European research activity for 157 nm lithography, with partners in Germany, France, Belgium and the Netherlands.
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