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Product Announcement

Orion III - Plasma Enhanced Chemical Vapor Deposition (PECVD) System

21 Oct 2010

The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.

For more information: http://www.triontech.com/orion.htm

CONTACT DETAILS
Trion Technology
2131 Sunnydale Blvd
Clearwater
FL
33765
United States
Tel: 727-461-1888
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