Date Announced: 11 Feb 2021
BELLINGHAM, Washington, USA — On 18 February, SPIE Press will host an interactive digital event with three top lithography authors. During the 90-minute session moderated by Fractilia CTO Chris Mack, authors Harry Levinson, Andreas Erdmann, and Burn Lin will discuss their recent and upcoming books and take questions from the audience. Registration for the event — which will take place in the lead-up to the 2021 SPIE Advanced Lithography Digital Forum — is free and open to the public.
• Harry Levinson is Editor-in-Chief of SPIE's Journal of Micro/Nanopatterning, Materials, and Metrology (JM3). His 2020 book, Extreme Ultraviolet Lithography, covers the many aspects of lithographic technology required to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography.
• Andreas Erdmann is Head of Computational Lithography and Optics at Fraunhofer IISB. The material for his upcoming book, Optical and EUV Lithography: A Modeling Perspective — with its particular focus on lithographic techniques for nanofabrication — was compiled from Erdmann's many years of lecturing on optical lithography technology, physical effects, and modeling at the Friedrich-Alexander-University Erlangen-Nuremberg, and from his preparation for courses on special aspects of lithography.
• Burn Lin is a Distinguished Research Chair Professor at National Tsing Hua University and director of the Tsing Hua-TSMC Joint Research Center. His upcoming book, Optical Lithography: Here is Why, Second Edition, covers the image-formation physics of a lithographic system and provides an overview of the future of optical lithography and the many next-generation technologies that may enhance semiconductor manufacturing. The second edition includes new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing, and optimization, and EUV and immersion lithographies.
"This is an exciting opportunity to hear from and interact with three of the key experts in the lithography field," said Mack. "Each of these authors has made seminal, major contributions to the field of lithography, and their books provide unique perspectives and insights. I'm excited to hear what each of these authors have to say — and to find out what kinds of questions the audience will bring to the table."
The event will be recorded, and the recording will be available for those who register.
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