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EUV sources - work in progress
The technical challenges of developing reliable EUV light sources had been underestimated by Cymer's key customer, the lithography system integrator ASML. Since the start of 2011 ASML has taken a more active role in EUV source development, and although challenges are still seen in achieving an output power level of 100W (60 wafers per hour), Cymer CEO Bob Akins believes that ramping power beyond that level will become more predictable - he sees the move from 100W to 250W, needed for genuine volume production, as primarily an engineering exercise. Credit: Cymer.
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