 |
 |
| The forthcoming generation of high numerical aperture (high-NA) extreme ultraviolet lithography (EUV) equipment requires even more complex and large-scale optics than the state-of-the-art "regular" EUV tools sold by ASML. The first commercial deployments of high-NA systems - featuring Zeiss optics like that shown in the image - are expected in 2025, with a ramp to volume production the following year. Photo: Zeiss. |
| © 2024 SPIE Europe |
|
