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Under development: high-NA optics for EUV tools
A major focus of Zeiss' extensive R&D current budget will be high numerical aperture (high-NA) optics for extreme ultraviolet (EUV) lithography systems built by key partner ASML. The next-generation reflective optics will enable the tiny feature sizes of today's state-of-the-art semiconductor devices to be shrunk even further. Photo: Zeiss.
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