17 Oct 2016 Jefferson Hills, PA. The Kurt J. Lesker Company® is proud to introduce the IMPULSE™ HiPIMS power supply. This supply is a cost effective solution designed for implementing HiPIMS capability to smaller scale coating applications. It is ideal for process development and R&D applications and can be integrated to any existing sputtering system and sputtering source. This supply requires a DC power supply, which is converted to the HiPIMS power.
The IMPULSE unit has a 2kW output and is offered in both a Single and Dual configuration. The Dual configuration provides the ability to power two (2) independent sources up to 2kW each which is ideal for co-deposition. High repetition rates, up to 2 kHz, enable higher deposition rates with shorter pulses. Another option is to run 4kW into a single source, since both units can be set for either “master” or “slave” mode. The Dual option also has a DC bias option for the substrate. If a researcher is using the Dual supply with a single source, he can use the additional supply for a DC bias on the substrate.
The IMPULSE has both front panel and remote control options with up to five user-selectable presets. KJLC has these power supplies in stock for immediate delivery. For more information or to place an order, please contact us at 1-800-245-1656 or e-mail us at salesus@lesker.com
The Kurt J. Lesker Company (KJLC), founded in 1954, is a global manufacturer and distributor of vacuum components and systems for the high- and ultra‑high vacuum equipment market. | 
