New nanopositioning stage for micropositioning Nov 12, 2008

- clearance of 30x30mm²
- motion range of up to 250 microns in open loop
- up to 200 microns in closed loop.
- can be equipped with an capacitive sensor

The system provides supreme position stability, linearity, repeatability and accuracy.

Thanks to the FEA-optimized guidance, the system features supreme trajectory accuracy.

PXY 201 line is equipped with an internal passive damping system. Also any kind of position noise is reduced.

Vacuum and cryogenic performances are available on request as well as, body material variations of invar, super invar, aluminum or titanium.

PXY 201 CAP is an excellent choice for scanning microscopy, surface analysis, metrology and alignment and nanopositioning and micro scanning.

More products from this company

• Mirror tilting system PKS 1 Mar 8, 2010
• piezo microscope objective fine positioner series MIPOS for nanopositioning Dec 4, 2008
• Miniaturized measurement system for nanopositioning of positioning stages Oct 10, 2008
• New dynamic nanopositioning stage nanoSX 800 CAP Sep 25, 2008
• piezo-nanopositioner nanoMIPOS 400 CAP for micro objectives Sep 15, 2008
• High-Frequency Mirror Tilting System PSH 4/1 Aug 27, 2008
• Nano-positioning high loads with high dynamics Aug 8, 2008
• New dynamic nano positioner PX 50 CAP Apr 28, 2008
• Tritor 50 CAP Mar 13, 2008