conference
SPIE Photomask Technology 2008
About this event
- Web site
- spie.org/photomask…
- When
- 5–10 Oct 2008
- Where
- Monterey, CA, United States
- Registration deadline
- 10 Sep 2008
- Organiser
- SPIE
- Contact address
-
Customer Service
1000 20th St
Bellingham
WA
United States - Tel
- +1 360 676 3290
- customerservice@spie.org…
Description
The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.
Help solve the most pressing issues in:
• Mask Infrastructure
• Mask Integration
• Emerging Mask Technology
• Mask Business